1.

国際会議録
国際会議録
1. The Vertical Replacement-Gate (VRG) MOSFET: A High-Performance, Vertical MOSFET with Lithography-Independent Critical Dimensions
Hergenrother, J.M. ; Oh, S.H. ; Nigam, T. ; Monroe, D. ; Klemens, F.P. ; Kornblit, A. ; Baumann, F.H. ; Grazul, J.L. ; Johnson, R.W. ; King, C.A. ; Kleiman, R.N.
出版情報: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.381-392,  2001.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2001-9
2.

国際会議録
国際会議録
2. Measurement technique, oxide thickness and area dependence of soft-breakdown
Nigam, T. ; Degraeve, R. ; Groeseneken, G. ; Heyns, M. ; Maes, H. E.
出版情報: Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A..  pp.337-,  2000.  Warrendale, PA.  MRS-Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 592
3.

国際会議録
国際会議録
3. Critical Processes for Ultrathin Gate Oxide Integrity
Depas, M. ; Heyns, M.M. ; Nigam, T. ; Kenis, K. ; Sprey, H. ; Wilhelm, R. ; Crossley, A. ; Sofield, C.J. ; Graef, D.
出版情報: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.352-366,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-1
4.

国際会議録
国際会議録
4. The Application of Solid Source Diffusion in the Vertical Replacement-Gate (VRG) MOSFET
Oh, Sang-Hyun ; Hergenrdther, Jack ; Monroe, Don ; Nigam, T. ; Klemens, F.P. ; Kornblit, A. ; Mansfield, W.M. ; Baumaun, F.H. ; Gossmann, H.J. ; King, C.A. ; Kleiman, R, N. ; Vuong, H.-H. ; Weber, G.R. ; Rafferty, C.S.
出版情報: Si front-end processing - physics and technology of dopant-defect interactions II : symposium held April 24-27, 2000, San Francisco, California, U.S.A..  pp.B3.2-,  2001.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 610
5.

国際会議録
国際会議録
5. Influence of Boron Diffusion on Ultrathin Oxides
Nigam, T. ; Depas, M. ; Heyns, M. ; Sofield, C. J. ; Mapeldoram, L.
出版情報: Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A..  pp.101-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 473