μc SILICON THIN FILMS DEPOSITED BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITORS PROCESS
- 著者名:
Wang, C Parsons, G. N. Kim, S. S. Buehler, E. C. Nemanich, R. J. Locuvsky, G. - 掲載資料名:
- Amorphous silicon technology, 1990 : symposium held April 17-20, 1990, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 192
- 発行年:
- 1990
- 開始ページ:
- 535
- 終了ページ:
- 540
- 総ページ数:
- 6
- 出版情報:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990814 [155899081X]
- 言語:
- 英語
- 請求記号:
- M23500/192
- 資料種別:
- 国際会議録
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12
国際会議録
Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films
Trans Tech Publications |