Reduction of the Phase Transition Temperature of TiSi2 on Si(111) Using a Ta Interlayer

Reduction of the Phase Transition Temperature of TiSi2 on Si(111) Using a Ta Interlayer

著者名:

掲載資料名:

Advanced interconnects and contacts : symposium held April 5-7, 1999, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

564

発行年:

1999

開始ページ:

59

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994713 [1558994718]

言語:

英語

請求記号:

M23500/564

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019849
シリーズID:	PA00000011
会議名:	Symposium on advanced interconnects and contacts
回次:	1999
会議開催地:	San Francisco, CA, USA
会議開催年:	1999.04.05-1999.04.07

類似資料:

1 国際会議録 PHASE TRANSITION AND FORMATION OF TiSi2 CODEPOSITED ON ATOMICALLY CLEAN Si(111) Jeon, Hyeongtag, Cho, Y. S., Kang, E. Y., Park, J. W., Nemanich, R. J. MRS - Materials Research Society	7 国際会議録 LOCAL STRUCTURAL STUDIES OF TiSi2 AND ZrSi2 THIN FILMS ON Si(111) SURFACES Dao, Y., Edwards, A. M., Sayers, D. E., Nemanich, R. J. MRS - Materials Research Society
2 国際会議録 EPITAXIAL GROWTH AND STABILITY OF 649 TiSi2 ON Si(111) Jeon, Hyeongtag, Honeycutt, J. W., Sukow, C. A., Humphreys, T. P., Nemanich, R. J., Rozgonyi, G. A. Materials Research Society	8 国際会議録 *NUCLEATION AND MORPHOLOGY OF TiSi2 ON Si Nemanick, R. J., Jeon, Hyeongtag, Sukow, C. A., Honeycutt, J, W., Rozgonyi, G.,A Materials Research Society
3 国際会議録 THICKNESS DEPENDENCE OF EPITAXIAL TiSi2 ON Si(111) Jeon, Hyeongtag, Honeycutt, J.W., Sukow, C.A., Rozgonyi, G.A., Nemanich, R.J. Materials Research Society	9 国際会議録 A Suppression of the Phase Transition and Agglomeration of TiSi2 by Addition of Zr Element Yoon, Sanghyun, Jeon, Hyeongtag MRS - Materials Research Society
4 国際会議録 INTERFACE MORPHOLOGY, NUCLEATION AND ISLAND FORMATION OF TiSi2 ON Si(111) Jeon, Hyeongtag, Sukow, C. A., Honeycutt, J. W., Humphreys, T. P., Nemanich, R. J., Rozgonyi, G. A. Materials Research Society	10 国際会議録 X-RAY ABSORPTION STUDIES OF TITANIUM SILICIDE FORMATION AT THE INTERFACE OF Ti DEPOSITED ON Si Aldrich, D.B., Fiordalice, R.W., Jeon, H., Islam, Q., Nemanich, R.J., Sayers, D.E. Materials Research Society
5 国際会議録 Reduction of the C54-TiSi2 Phase Formation Temperature Using Metallic Impurities Mann, R. W., Clevenger, L. A., Miles, G. L., Harper, J. M. E., Cabral, C., Jr, d'Heurle, F. M., Knotts, T. A., Rakowski, … MRS - Materials Research Society	11 国際会議録 Electrical properties of nanoscale TiSi2 islands on Si Oh, Jaehwan, Ham, Hoon, Laloli, Peter, Nemanich, R. J. MRS-Materials Research Society
6 国際会議録 SURFACE MORPHOLOGIES AND INTERFACES OF TiSi2 FORMED FROM UHV DEPOSITED Ti ON Si Jeon, Hyeongtag,, Nemanich, R.J., Honeycutt, J.W., Rozgonyi, G.A. Materials Research Society	12 国際会議録 A Low Temperature Direct Bonding Method Using an Electron-Beam Evaporated Silicon-Oxide Interlayer Park, H. W., Ju, B. K., Lee, Y. H., Park, J. H., Lee, N. Y., Koh, K. H., Shin, D. K., Kang, I. B., Samaan, N., Haskard, … MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12