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A STUDY OF SURFACE AND SUBSURFACE PROPERTIES OF Si(100) AFTER HYDROGEN ION-BEAM EXPOSURE

著者名:
Liu, H. X.
Schneider, T. P.
Montgomery, J.
Chen, Y. L.
Buczkowski, A.
Shimura, F.
Nemanich, R. J.
Maher, D. M.
Korzec, D.
Engemann, J.
さらに 5 件
掲載資料名:
Surface chemical cleaning and passivation for semiconductor processing
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
315
発行年:
1993
開始ページ:
231
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992139 [1558992138]
言語:
英語
請求記号:
M23500/315
資料種別:
国際会議録

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