1.

国際会議録
国際会議録
1. Thickness Effects in the Reaction of Cobalt With Silicon-Germanium Alloys
Boyanov, B. I. ; Goeller, P. T. ; Sayers, D. E. ; Nemanich, R. J.
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.165-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514
2.

国際会議録
国際会議録
2. Morphology of NiSi Film on Si(100): Role of the Interface Strain
Maillard-Schaller, Eliane ; Boyanov, B. I. ; English, S. ; Nemanich, R. J.
出版情報: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.185-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 514