1.

国際会議録
国際会議録
1. Correlation of Roughness and Device Properties for Hydrogen Plasma Cleaning of Si(100) Prior to Gate Oxidation
Montgomery, J. S. ; Barnak, J. P. ; Silvestre, C. ; Hauser, J. R. ; Nemanich, R. J.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.279-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386
2.

国際会議録
国際会議録
2. Removal of Fluorine from a Si(100) Surface by a Remote rf hydrogen Plasma
Barnak, J. P. ; King, S. ; Montgomery, J. ; Ku, Ja-Hum ; Nemanich, R. J.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.357-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386
3.

国際会議録
国際会議録
3. Removal of SiO2 from Si(100) by Remote H2/SiH4 Plasma Prior to Epitaxial Growth
Barnak, J. P. ; Ying, H. ; Chen, Y. L. ; Montgomery, J. ; Nemanich, R. J.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.351-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386
4.

国際会議録
国際会議録
4. RIE Passivation Layer Removal by Remote H-Plasma and H2/SiH4 Plasma Processing
Ying, Hong ; Barnak, J. P. ; Chen, Y. L. ; Nemanich, R. J.
出版情報: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.285-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 386