1.

国際会議録
国際会議録
1. Novel single-layer chemically amplified resist for 193-nm lithography
Choi,S.-J. ; Kang,Y. ; Jung,D.-W. ; Park,C.-G. ; Moon,J.-T.
出版情報: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.104-112,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3049
2.

国際会議録
国際会議録
2. Novel polymers for 193-nm single-layer resist based on cycloolefin polymers
Kim,H.-W. ; Lee,S.-H. ; Kwon,K.-Y. ; Jung,D.-W. ; Lee,S. ; Yoon,K.-S. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.
出版情報: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1100-1107,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3999
3.

国際会議録
国際会議録
3. Novel 193-nm photoresist based on Olefin-containing lactones
Yoon,K.-S. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.688-694,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345
4.

国際会議録
国際会議録
4. Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone
Tanaka,T. ; Choi,S.-J. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T. ; Kavanagh,R.J. ; Barclay,G.G. ; Orsula,G.W. ; Mattia,J. ; Caporale,S. ; Adams,T.G. ; Tanaka,T. ; Kang,D.
出版情報: Advances in Resist Technology and Processing XVIII.  4345  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4345