Dielectric Breakdown Characteristics of poly-Si/HfAlOx/SiON Gate Stack
- 著者名:
Torii, Kazuyoshi Ohji, Hiroshi Mutoh, Akiyoshi Kawahara, Takaaki Mitsuhashi, Riichiro Horiuchi, Atsushi Miyazaki, S. Kitajima, Hiroshi - 掲載資料名:
- Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 811
- 発行年:
- 2004
- 開始ページ:
- 37
- 終了ページ:
- 42
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997615 [155899761X]
- 言語:
- 英語
- 請求記号:
- M23500/811
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Characterization of Charge Trapping and Dielectric Breakdown of HfAlOx/SiON Dielectric Gate Stack
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