1.

国際会議録
国際会議録
1. SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES
Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.
出版情報: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.391-398,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 259
2.

国際会議録
国際会議録
2. Influence of the Height Difference between the First and Second Nitride Layer on Erosion and Dishing in the Dual Nitride Approach for Shallow Trench Isolation
Heylen, N. ; Grillaert, J. ; Vrancken, E ; Badenes, G. ; Rooyackers, R. ; Meuris, M. ; Heyns, M.
出版情報: Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing.  pp.26-36,  1998.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-7
3.

国際会議録
国際会議録
3. IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS
Teerlinck, I. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Hurd, T.Q. ; Mouche, L. ; Mertens, P.W. ; Meuris, M. ; Heyns, M.M. ; Vanhaeren, D. ; Vandervorst, W.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.284-291,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
4.

国際会議録
国際会議録
4. *CLEANING OF METAL CONTAMINATION
Mertens, P.W. ; Hurd, T.Q. ; Graf, D. ; Meuris, M. ; Schmidt, H.F. ; Heyns, M.M.
出版情報: Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III.  pp.241-252,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-9
5.

国際会議録
国際会議録
5. CORROSION OF ALUMINUM ALLOYS DURING DRYING OF METALLIZED WAFERS
Vos, R. ; Meuris, M. ; Mertens, P. ; Heyns, M. ; Hatcher, Z.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.569-578,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
6.

国際会議録
国際会議録
6. Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides
Verhaverbeke, S. ; Meuris, M. ; Mertens, P. ; Schmidt, H. ; Heyns, M.M. ; Philipossian, A. ; Graeff, D. ; Dillenbeck, K.
出版情報: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.199-219,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-13
7.

国際会議録
国際会議録
7. APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR
Wolke, K. ; Riedel, T. ; Haug, R. ; De Gendt, S. ; Heyns, M.M. ; Meuris, M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.204-211,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
8.

国際会議録
国際会議録
8. A SEMI-QUANTITATIVE METHOD FOR STUDYING PHOTORESIST STRIPPING
Rotondaro, A.L.P. ; Meuris, M. ; Schmidt, H.F. ; Heyns, M.M. ; Vandervorst, W. ; Claeys, C. ; Hellemans, L. ; Snauvaert, I.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.581-586,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
9.

国際会議録
国際会議録
9. DETERMINATION OF THE H-PASSIVATION BUILD-UP TIME IN DHF-TREATMEN
Meuris, M. ; Izumi, H. ; Kubo, K. ; Ojima, S. ; Ohmi, T. ; Heyns, M.M.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.444-448,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
10.

国際会議録
国際会議録
10. EFFICIENCY OF OZONATED DI WATER IN REMOVING ORGANIC CONTAMINATION
Kenens, C. ; De Gendt, S. ; Knotter, D.M. ; Loewenstein, L.M. ; Meuris, M. ; Vandervorst, W. ; Heyns, M.M.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.247-255,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
11.

国際会議録
国際会議録
11. QUANTITATIVE MODELING OF H2O2 DECOMPOSITION IN SC1
Mertens, P. ; Baeyens, M. ; Moyaerts, G. ; Okorn-Schmidt, H. ; Vos, R. ; De Waele, R. ; Hatcher, Z. ; Hub, W. ; De Gendt, S. ; Knotter, M. ; Meuris, M. ; Heyns, M.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.176-183,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
12.

国際会議録
国際会議録
12. Effect of Cl in Gate Oxidation
Mertens, P. W. ; McGeary, M. J. ; Schaekers, M. ; Sprey, H. ; Vermeire, B. ; Depas, M. ; Meuris, M. ; Heyns, M. M.
出版情報: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.89-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 477
13.

国際会議録
国際会議録
13. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
14.

国際会議録
国際会議録
14. Ion implantation in Ge and associated defect control (invited paper)
Satta, A. ; Simoen, E. ; Janssens, T. ; Benedetti, A. ; Clarysse, T. ; De Jaeger, B. ; Geenen, L. ; Brijs, B. ; Meuris, M. ; Vandervorst, W.
出版情報: Crystalline defects and contamination: their impact and control in device manufacturing IV : DECON 2005 : proceedings of the Satellite Symposium to ESSDERC 2005, Grenoble, France.  pp.52-60,  2005.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-10
15.

国際会議録
国際会議録
15. 56 Dopants for n and p Junctions in Germanium
Satta, A. ; Simoen, E. ; Meuris, M. ; Janssens, T. ; Clarysse, T. ; Demeurisse, C. ; Hoflijk, I. ; Vandervorst, W.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.468-475,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
16.

国際会議録
国際会議録
16. Characterization of Slurry System and Suppression of Oxide Erosion in Aluminum CMP (Chemical-Mechanical Planarization)
Devriendt, ft. ; Grilaert, J. ; Heylen, N. ; Holl, K. ; Meuris, M. ; Yang, J. ; Zhong, L.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.115-122,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
17.

国際会議録
国際会議録
17. Modeling the Influence of Pad Bending on the Planarization Performance During CMP
Devriendt, K. ; Fyen, W. ; Grillaert, J. ; Heylen, N. ; Heyns, M. ; Meuris, M. ; Vrancken, E.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.45-50,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
18.

国際会議録
国際会議録
18. CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY
Mertens, P.W. ; Meuris, M. ; Schmidt, H.F. ; Verhaverbeke, S. ; Heyns, M.M. ; Carr, P. ; Graeff, D. ; Schnegg, A. ; Kubota, M. ; Dillenbeck, K. ; de Blank, R.
出版情報: Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing.  pp.87-102,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-15
19.

国際会議録
国際会議録
19. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.163-168,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
20.

国際会議録
国際会議録
20. A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES
Meuris, M. ; Verhaverbeke, S. ; Mertens, P.W. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Heyns, M.M. ; Philipossian, A.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-25,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
21.

国際会議録
国際会議録
21. MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS
Verhaverbeke, S. ; Meuris, M. ; Schmidt, H. ; Mertens, P. ; Heyns, M.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.176-185,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
22.

国際会議録
国際会議録
22. Oxidation of Glassy and Nanocrystalline Zr70Pd30 Alloys
Jastrow, L. ; Meuris, M. ; Koster, U. ; Froumin, N. ; Eliezer, D.
出版情報: Metastable, mechanically alloyed and nanocrystalline materials : ISMANAM 2001 : proceedings of the International Symposium on Metastable, Mecanically Alloyed and Nanocrystalline Materials, University of Michigan, Ann Arbor, MI, USA, Jun 24-29, 2001.  pp.627-632,  2002.  Zurich-Uetikon, Switzerland.  Trans Tech Publications
シリーズ名: Materials science forum
シリーズ巻号: 386-388
23.

国際会議録
国際会議録
23. NEW WET CLEANING STRATEGIES FOR OBTAINING HIGHLY RELIABLE THIN OXIDES
Heyns, M. M. ; Verhaverbeke, S. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. ; Kubota, M. ; Philipossian, A. ; Dillenbeck, K. ; Graf, D. ; Schnegg, A. ; Blank, R. de
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.35-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
24.

国際会議録
国際会議録
24. HF-LAST CLEANINGS: A STUDY OF THE PROPERTIES WITH RESPECT TO THE DIFFERENT VARIABLES
Verhaverbeke, S. ; Bender, H. ; Meuris, M. ; Mertens, P. W. ; Schmidt, H. F. ; Heyns, M. M.
出版情報: Surface chemical cleaning and passivation for semiconductor processing.  pp.457-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 315
25.

国際会議録
国際会議録
25. Effect of Cl in Gate Oxidation
Mertens, P. W. ; McGeary, M. J. ; Schaekers, M. ; Sprey, H. ; Vermeire, B. ; Depas, M. ; Meuris, M. ; Heyns, M. M.
出版情報: Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A..  pp.149-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 473
26.

国際会議録
国際会議録
26. COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES
Elsmore, C. ; Hurd, T.Q. ; Clarke, J. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.142-149,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
27.

国際会議録
国際会議録
27. In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements
Schmidt, H.F ; Teerlinck, I. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
出版情報: ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands.  pp.316-328,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-30
28.

国際会議録
国際会議録
28. 18 Optimized HF Solutions in ULSI Technology
Teerlinck, I. ; Mertens, P.W. ; Vos, R. ; Meuris, M. ; Heyns, M.M.
出版情報: Proceedings of the Symposium on Environmental Aspects of Electrochemical Technology: applications in electronics.  pp.250-263,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-21