Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.
出版情報:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.391-398, 1992. Pittsburgh, Pa.. Materials Research Society
Teerlinck, I. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Hurd, T.Q. ; Mouche, L. ; Mertens, P.W. ; Meuris, M. ; Heyns, M.M. ; Vanhaeren, D. ; Vandervorst, W.
出版情報:
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.284-291, 1995. Pennington, NJ. Electrochemical Society
Rotondaro, A.L.P. ; Meuris, M. ; Schmidt, H.F. ; Heyns, M.M. ; Vandervorst, W. ; Claeys, C. ; Hellemans, L. ; Snauvaert, I.
出版情報:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.581-586, 1994. Pennington, NJ. Electrochemical Society
Kenens, C. ; De Gendt, S. ; Knotter, D.M. ; Loewenstein, L.M. ; Meuris, M. ; Vandervorst, W. ; Heyns, M.M.
出版情報:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.247-255, 1997. Pennington, NJ. Electrochemical Society
Satta, A. ; Simoen, E. ; Janssens, T. ; Benedetti, A. ; Clarysse, T. ; De Jaeger, B. ; Geenen, L. ; Brijs, B. ; Meuris, M. ; Vandervorst, W.
出版情報:
Crystalline defects and contamination: their impact and control in device manufacturing IV : DECON 2005 : proceedings of the Satellite Symposium to ESSDERC 2005, Grenoble, France. pp.52-60, 2005. Pennington, N.J.. Electrochemical Society
Satta, A. ; Simoen, E. ; Meuris, M. ; Janssens, T. ; Clarysse, T. ; Demeurisse, C. ; Hoflijk, I. ; Vandervorst, W.
出版情報:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.468-475, 2005. Pennington, NJ. Electrochemical Society