1.

国際会議録
国際会議録
1. SURFACE CHARACTERISATION OF Si AFTER HF TREATMENTS AND ITS INFLUENCE ON THE DIELECTRIC BREAKDOWN OF THERMAL OXIDES
Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.
出版情報: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.391-398,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 259
2.

国際会議録
国際会議録
2. Influence of the Height Difference between the First and Second Nitride Layer on Erosion and Dishing in the Dual Nitride Approach for Shallow Trench Isolation
Heylen, N. ; Grillaert, J. ; Vrancken, E ; Badenes, G. ; Rooyackers, R. ; Meuris, M. ; Heyns, M.
出版情報: Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing.  pp.26-36,  1998.  Pennington, N. J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-7
3.

国際会議録
国際会議録
3. CORROSION OF ALUMINUM ALLOYS DURING DRYING OF METALLIZED WAFERS
Vos, R. ; Meuris, M. ; Mertens, P. ; Heyns, M. ; Hatcher, Z.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.569-578,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
4.

国際会議録
国際会議録
4. QUANTITATIVE MODELING OF H2O2 DECOMPOSITION IN SC1
Mertens, P. ; Baeyens, M. ; Moyaerts, G. ; Okorn-Schmidt, H. ; Vos, R. ; De Waele, R. ; Hatcher, Z. ; Hub, W. ; De Gendt, S. ; Knotter, M. ; Meuris, M. ; Heyns, M.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.176-183,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
5.

国際会議録
国際会議録
5. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
6.

国際会議録
国際会議録
6. Modeling the Influence of Pad Bending on the Planarization Performance During CMP
Devriendt, K. ; Fyen, W. ; Grillaert, J. ; Heylen, N. ; Heyns, M. ; Meuris, M. ; Vrancken, E.
出版情報: Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A..  pp.45-50,  2000.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 566
7.

国際会議録
国際会議録
7. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.163-168,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811
8.

国際会議録
国際会議録
8. MODELLING OF THE HYDROGEN PASSIVATION KINETICS OF Si IN DILUTE HF SOLUTIONS
Verhaverbeke, S. ; Meuris, M. ; Schmidt, H. ; Mertens, P. ; Heyns, M.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.176-185,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7