Transparent corner enhancement scheme for a DUV pattern generator
- 著者名:
- Martinsson, H. ( Micronic Laser Systems AB (Sweden) )
- Hellgren, J. ( Micronic Laser Systems AB (Sweden) )
- Eriksson, N. ( Micronic Laser Systems AB (Sweden) )
- Bjuggren, M. ( Micronic Laser Systems AB (Sweden) )
- Sandstrom, T. ( Micronic Laser Systems AB (Sweden) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 297
- 終了ページ:
- 308
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |