Real-time on-wafer evaluation of contaminant-induced defects from resist processing

Real-time on-wafer evaluation of contaminant-induced defects from resist processing

著者名:

Lowell,J.K. ( Advanced Micro Devices and Univ.of Texas/Austin )
Ackmann,P.W.
Brown,S.E.
Sherry,J.
Hossain,T.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2725

発行年:

1996

開始ページ:

206

終了ページ:

216

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421012 [0819421014]

言語:

英語

請求記号:

P63600/2725

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019794
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithography
回次:	1996 : 10th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.11-1996.03.13

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