1.

国際会議録
国際会議録
1. Which etchant used and whether an etching mask exists:how they make differences on convex-corner undercutting configuration and compensation criteria
Li,X. ; Lin,R. ; Miao,J. ; Bao,M.
出版情報: Micromachining and microfabrication process technology V : 20-22 September, 1999, Santa Clara, California.  pp.129-136,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3874
2.

国際会議録
国際会議録
2. Design considerations in micromachined silicon microphones
Miao,J. ; Lin,R. ; Chen,L. ; Zou,Q. ; Lim,S.Y. ; Seah,S.H.
出版情報: Design, modeling, and simulation in microelectronics : 28-30 November 2000, Singapore.  pp.309-314,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4228