Lin, O. ; Chou, J. ; fu, K. K. ; Lee, B. ; Lu, R. ; Lu, J. ; Shi, -L. C.
出版情報:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831S-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering