1.

国際会議録
国際会議録
1. Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
Lee, B. ; Hung, R. ; Lin, O. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Hsu, M. ; Hsu, S. D.
出版情報: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.114-121,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5645
2.

国際会議録
国際会議録
2. Advanced e-beam CAR resist evaluation for 65nm generation [5992-112]
Chan, G. ; Lin, O. ; Tseng, W. ; Lee, B. ; Huang, T. ; Kozuma, M.
出版情報: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923B-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5992