Antireflection strategies for sub-0.18-ヲフm dual-damascene structure patterning in KrF 248-nm lithography
- 著者名:
Chou,S.-Y. ( National Chiao Tung Univ. ) Wang,C.-M. Hsia,C.-C. Chen,L.-J. Hwang,G.-W. Lee,S.-D. Lou,J.-C. - 掲載資料名:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3679
- 発行年:
- 1999
- 巻:
- Part2
- 開始ページ:
- 923
- 終了ページ:
- 931
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- 言語:
- 英語
- 請求記号:
- P63600/3679
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
11
国際会議録
0.18-ヲフm lithography strategies:248-nm DUV step-and-scanner and advanced chemical amplified resist
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |