Characterization and reduction of highly localized substrate contamination defects in metal patterning
- 著者名:
Gu, Y. ( Integrated Device Technology, Inc. (USA) ) Zhang, A. Yu, Z. Cao, W. Chen, S. Sturtevant, J.L. Lee, S.K. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4689
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 636
- 終了ページ:
- 645
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- 言語:
- 英語
- 請求記号:
- P63600/4689
- 資料種別:
- 国際会議録
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