1.

国際会議録
国際会議録
1. Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
Dammel, R.R. ; Sakamuri, R. ; Lee, S.-H. ; Rahman, M.D. ; Kudo, T. ; Romano, A.R. ; Rhodes, L.F. ; Lipian, J. ; Hacker, C. ; Barnes, D.A.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.101-109,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
2.

国際会議録
国際会議録
2. High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate
Rahman, M.D. ; Alemy, E. ; Conley, W. ; Miller, D. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Padmanaban, M.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.127-135,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
3.

国際会議録
国際会議録
3. Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists
Kudo, T. ; Alemy, E.L. ; Dammel, R.R. ; Kim, W.-K. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Rahman, M.D. ; Romano, A.R. ; Padmanaban, M. ; Chun, J.-S. ; Jung, J.-C. ; Lee, S.-K. ; Shin, K.-S. ; Kim, H.-S.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.150-159,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690