Ultra Low-k Materials Based on Self-Assembled Organic Polymers

Ultra Low-k Materials Based on Self-Assembled Organic Polymers

著者名:

M. Pantouvaki

掲載資料名:

Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

1335

発行年:

2012

開始ページ:

3

終了ページ:

14

総ページ数:

12

出版情報:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781605113128 [1605113123]

言語:

英語

請求記号:

M23500/1335

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00051868
シリーズID:	PA00000011
会議名:	2011 MRS Spring Meeting ; Symposium O, Materials, Processes, and Reliability for Advanced Interconnects for Micro- and Nanoelectronics
回次:	2011
会議開催地:	San Francisco, CA
会議開催年:	2011.04.25-2011.04.29

類似資料:

1 国際会議録 Studies Of Copper Surfaces Modified By Thermal And Plasma Treatments Beyer, G.P., Baklanov, M., Conard, T., Maex, K. Materials Research Society	7 国際会議録 Effect of Chemical Solutions and Surface Wettability on the Stability of Advanced Porous Low-k Materials Q. T. Le, G. Vereecke, A. Bertha, E. Kesters, M. Lux, H. Struyf Materials Research Society
2 国際会議録 EFFICIENT CLEANING OF LOW-к MATERIALS USING SINGLE-WAFER CLEANING SOLUTION: A COMPATIBILITY STUDY AND ELECTRICAL CHARACTERIZATION Q. T. Le, J. Van Olmen, R. Vanderheyden, E. Kesters, K. Kenis, T. Conard, W. Boullart, M. R. Baklanov, S. … Electrochemical Society	8 国際会議録 Characterization of Plasma Damage in Low-k Films by TVS Measurements Ivan Ciofi, Mikhail R. Baklanov, Giovanni Calbo, Zsolt Tokei, Gerald Beyer Materials Research Society
3 国際会議録 Synthesis and Properties of Novel Low-Dimensional Ruthenium Materials: Self-Assembled Multilayers and Mixed Inorganic-Organic Polymers Li, DeQuan, Huckett, Sara C., Frankcom, Tracey, Paffett, M. T., Farr, J. D., Hawley, M. E., Gottesfeld, S., Thompson, J. … American Chemical Society	9 国際会議録 Characterization of Advanced Semiconductor Materials by Thermal Desorption Mass Spectrometry with Atmospheric, Pressure Ionization Carbonell, L., Vereecke, G., Van Elshocht, S., Caymax, M., Van Hove, M., Maex, K., Mertens, P. SPIE-The International Society for Optical Engineering
4 国際会議録 Defects in Low-k Insulators: ESR Analysis and Charge Injection V. V. Afanas'ev, K. Keunen, A. P. D. Nguyen, M. Jivanescu, A. Stesmans, Zs. Tokei, M. R. Baklanov, G. P. Beyer Materials Research Society	10 国際会議録 Characterization of Advanced Semiconductor Materials by Thermal Desorption Mass Spectrometry with Atmospheric, Pressure Ionization Carbonell, L., Vereecke, G., Van Elshocht, S., Caymax, M., Van Hove, M., Maex, K., Mertens, P. Electrochemical Society
5 国際会議録 Plasma Etching of Organic Low-Dielectric-Constant Polymers: Comparative Analysis Baklanov, M. R., Vanhaelemeersch, S., Alaerts, C., Maex, K. MRS - Materials Research Society	11 国際会議録 Ultra low thermal expansion material for telescope mirror substrate [6273-101 ] Nakajima K., Kawasaki T., Nakihama T., Owari Y., Minamikawa H. SPIE - The International Society of Optical Engineering
6 国際会議録 Novel monomeric amorphous material for second-order NLO: the low-molecular-weight organic glasses Ishow, E., Nakatani, K., Delaire, J., Qiu, L. Kluwer Academic Publishers	12 国際会議録 Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning Okoroanyanwu, U., Stepanenko, N., Vereecke, G., Eliat, A., Kocsis, M.K., Kang, Y.S., Jonckheere, R.M., Conard, T., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12