Challenges and solutions for transferring a 248-nm process to 365-nm imaging
- 著者名:
A. Serebriakov ( ASML Netherlands B.V. (Netherlands) ) C. Chang ( SMIC (China) ) A. Becht ( ASML Netherlands B.V. (Netherlands) ) R. Pluijms ( ASML Netherlands B.V. (Netherlands) ) A. Cheng ( ASML Netherlands B.V. (Netherlands) ) E. Shi ( ASML Netherlands B.V. (Netherlands) ) H. van den Broek ( ASML Netherlands B.V. (Netherlands) ) L. Zhao ( ASML Netherlands B.V. (Netherlands) ) - 掲載資料名:
- Optical microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6520
- 発行年:
- 2007
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- 言語:
- 英語
- 請求記号:
- P63600/6520
- 資料種別:
- 国際会議録
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11
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The investigation of 193nm CPL 3D topology mask effect on wafer process performance [6154-87]
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