1.

国際会議録
国際会議録
1. MODELINF OF SILICON DEPOSITION YIELD AT LOW TEMPERATURE BY ArF EXCIMER LASER PHOTOLYSIS OF DISILANE
Fowler, B. ; Lian, S. ; Krishnan, S. ; Li, C. ; Jung, L. ; Samara, D. ; Manna, I. ; Banerjee, S.
出版情報: Mechanisms of Heteroepitaxial growth : symposium held April 27-30, 1992, San Francisco, California, U.S.A..  pp.203-208,  1992.  Pittsburgh, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 263
2.

国際会議録
国際会議録
2. ArF EXCIMER LASER-ENHANCED PHOTOCHEMICAL VAPOR DEPOSITION OF HOMOEPITAXIAL SILICON FROM DISILANE
Fowler, B. ; Lian, S. ; Krishnan, S. ; Jung, L. ; Banerjee, S.
出版情報: Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.323-328,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 224