1.

国際会議録
国際会議録
1. Accurate proximity correction method with total-process proximity-based correction factor(TCF)
Hashimoto,K. ; Usui,S. ; Hasebe,S. ; Murota,M. ; Nakayama,T. ; Matsuoka,F. ; Inoue,S. ; Kobayashi,S. ; Yamamoto,K.
出版情報: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.224-233,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3334
2.

国際会議録
国際会議録
2. Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers
Kobayashi,S. ; Uno,T. ; Yamamoto,K. ; Tanaka,S. ; Kotani,T. ; Inoue,S. ; Higurashi,H. ; Watanabe,S. ; Yano,M. ; Ohki,S. ; Tsunakawa,K.
出版情報: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.614-621,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3679