Development and Optimization of a Defect-Free P- EPI Process With a Patterned Antimony Subcollector for ULSI BICMOS Technology

Development and Optimization of a Defect-Free P- EPI Process With a Patterned Antimony Subcollector for ULSI BICMOS Technology

著者名:

掲載資料名:

Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing II

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-3

発行年:

1994

開始ページ:

51

終了ページ:

62

総ページ数:

12

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770651 [1566770653]

言語:

英語

請求記号:

E23400/941395

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014113
シリーズID:	PA00000028
会議名:	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing ; Electrochemical Spring Meeting
回次:	2nd ; 1993
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1993.05.16-1993.05.22

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