1.

国際会議録
国際会議録
1. Insertion effects of various acid sensitive groups into acetal type polymer on the profile of 248-nm chemically amplified resist
Chung, Y.-S. ; Kim, H.-J. ; Cho, S.-H. ; Lee, D.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.-Y.
出版情報: Advances in Resist Technology and Processing XIX.  Part Two  pp.660-670,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
2.

国際会議録
国際会議録
2. Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248-nm chemically amplified resist
Kim, H.-J. ; Chung, Y.-S. ; Lee, D.-H. ; Cho, S.-H. ; Im, K.-H. ; Yim, Y.-G. ; Kim, D.-B. ; Kim, J.Y.
出版情報: Advances in Resist Technology and Processing XIX.  Part Two  pp.651-659,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
3.

国際会議録
国際会議録
3. Effects of quencher ability on profile in chemically amplified resist system
Kim, D. ; Kim, H.-J. ; Cho, S.-H. ; Lee, D.-H. ; Im, K.-H. ; Yoo, M.-J. ; Lee, S.-H. ; Kim, J. ; Kim, J.-S. ; Kim, H.-S.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.1086-1097,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039