1.

国際会議録
国際会議録
1. EVALUATION OF Si SURFACE CONDITIONS BY THE USE OF A SURFACE PHOTOVOLTAGE TECHNIQUE
Trauwaert, M.-A. ; Kenis, K. ; Caymax, M. ; Mertens, P.W. ; Heyns, M.M. ; Vanhellemont, J. ; Graf, D. ; Wagner, P.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.455-462,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
2.

国際会議録
国際会議録
2. Effect of Metal Contamination and Improved Cleaning Strategies
Mertens, P.W. ; Bearda, T. ; Lowewenstein, L.M. ; Martin, A.R. ; Hub, W. ; Kolbesen, B.O. ; Teerlink, I. ; Vos, R. ; Baeyens, M. ; Gendt, S.De ; Kenis, K. ; Heyns, M.M.
出版情報: Proceedings of the Third International Symposium on Defects in Silicon.  pp.401-413,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-1
3.

国際会議録
国際会議録
3. Critical Processes for Ultrathin Gate Oxide Integrity
Depas, M. ; Heyns, M.M. ; Nigam, T. ; Kenis, K. ; Sprey, H. ; Wilhelm, R. ; Crossley, A. ; Sofield, C.J. ; Graef, D.
出版情報: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.352-366,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-1