Vereecke, G. ; Holsteyns, F. ; Veltens, J. ; Lux, M. ; Amauts, S. ; Kenis, K. ; Vos, R. ; Mertens, P. ; Heyns, M.
出版情報:
Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.145-152, 2003. Pennington, NJ. Electrochemical Society
Lauerhaas, J. ; Wu, Y. ; Xu, K. ; Vereecke, G. ; Vos, R. ; Kenis, K. ; Mertens, P. ; Nicolosi, T. ; Heyns, M.
出版情報:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.147-155, 2001. Pennington, N.J.. Electrochemical Society