Resist heating dependence on subfield scheduling in 50-kV electron beam maskmaking
- 著者名:
- Babin, S.V. ( Soft Services (USA) )
- Kahng, A.B. ( Univ. of California, San Diego (USA) )
- Mandoiu, I. ( Univ. of California, San Diego (USA) )
- Muddu, S.V. ( Univ. of California, San Diego (USA) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5130
- 発行年:
- 2003
- 開始ページ:
- 718
- 終了ページ:
- 726
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- 言語:
- 英語
- 請求記号:
- P63600/5130
- 資料種別:
- 国際会議録
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