The impact of mask photoresist develop on critical dimension parameters
- 著者名:
- A. C. Smith ( IBM System and Technology Group, USA )
- D. B. Sullivan ( IBM System and Technology Group, USA )
- K. Sugawara ( Toppan Electronics Inc., USA )
- Y. Okawa ( Toppan Electronics Inc., USA )
- 掲載資料名:
- Photomask technology 2007
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6730
- 発行年:
- 2007
- 巻:
- 1
- 開始ページ:
- 67300L-1
- 終了ページ:
- 67300L-9
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819468871 [0819468878]
- 言語:
- 英語
- 請求記号:
- P63600/6730
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
国際会議録
Post coat delay effects on chemically amplified resists and storage condition impacts [5922-21]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |