1.

国際会議録
国際会議録
1. STUDIES OF THE EFFECT OF RAPID THERMAL ANNEALING ON THE STRUCTURAL AND ELECTRICAL PROPERTIES OF THE HETEROEPITAXIAL CaF2/CoSi2/Si(111) STRUCTURES
Phillips, Julia M. ; Hensel, J.C. ; Joy, D.C. ; Augustyniak, W.M.
出版情報: Beam-solid interactions and transient processes : symposium held December 1-4, 1986, Boston, Massachusetts, U.S.A..  pp.609-614,  1987.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 74
2.

国際会議録
国際会議録
2. ELECTRON BEAM INDUCED CURRENT STUDIES OF NICKEL SILICIDE/SILICON SCHOTTKY BARRIER HEIGHTS
Gibson, J.M. ; Joy, D.C. ; Tung, R.T. ; Ellison, J.L. ; Pimentel, C. ; Levi, A.F.J.
出版情報: Layered structures and epitaxy : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A..  pp.163-170,  1985.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 56
3.

国際会議録
国際会議録
3. IDENTIFICATION OF CLEAVAGE PLANES IN AN Al3Ti-BASE ALLOY BY ELECTRON CHANNELING IN THE SEM
George, E.P. ; Porter, W.D. ; Joy, D.C.
出版情報: High-Temperature ordered intermetallic alloys III : symposium held November 29-December 1, 1988, Boston, Massachusetts, U.S.A..  pp.311-316,  1989.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 133
4.

国際会議録
国際会議録
4. RELATIVE LATTICE PARAMETER MEASUREMENT IN QUATERNARY (InGaAsP) LAYERS ON InP SUBSTRATES USING CONVERGENT BEAM ELECTRON DIFFRACTION
Twigg, M.E. ; Chu, S.N.G. ; Joy, D.C. ; Maher, D.M. ; Macrander, A.T. ; Nakahara, S. ; Chin, A.K.
出版情報: Materials characterization : symposium held April 15-17, 1986, Palo Alto California, U.S.A..  pp.147-152,  1986.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 69
5.

国際会議録
国際会議録
5. THREE DIMENSIONAL CHARACTERIZATION OF INTERFACES IN SEMICONDUCTORS BY SCANNING ELECTRON MICROSCOPY
Joy, D.C. ; Maher, D.M. ; Farrow, R.C.
出版情報: Materials characterization : symposium held April 15-17, 1986, Palo Alto California, U.S.A..  pp.171-176,  1986.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 69
6.

国際会議録
国際会議録
6. *EXTENDED DEFECTS IN AMORPHIZED AND RAPID THERMALLY ANNEALED SILICON
Maher, D.M. ; Knoell, R.V. ; Ellington, M.B. ; Hull, R. ; Jacobson, D.C. ; Joy, D.C.
出版情報: Rapid thermal processing : symposium held December 2-4, 1985, Boston, Massachusetts, U.S.A..  pp.93-106,  1985.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 52
7.

国際会議録
国際会議録
7. Applications of image diagnostics to metrology quality assurance and process control
Allgair, J.A. ; Boksha, V.V. ; Bunday, B.D. ; Diebold, A.C. ; Cole, D.C. ; Davidson, M.P. ; Hutcheson, J.D. ; Gurnell, A.W. ; Joy, D.C. ; McIntosh, J.M. ; Muckenhirn, S.G. ; Pellegrini, J.C. ; Larrabee, R.D. ; Potzick, J.E. ; Vlada, A.E. ; Smith, N.P. ; Starikov, A. ; Sulivan, N.T. ; Wells, O.C.
出版情報: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.251-277,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5042
8.

国際会議録
国際会議録
8. REDUCED SUBBOUNDARY MISALIGNMENT IN SOl FILMS SCANNED AT LOW VELOCITIES
Pfeiffer, L. ; West, K.W. ; Joy, D.C. ; Gibson, J.M. ; Gelman, A.E.
出版情報: Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A..  pp.29-38,  1985.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 53
9.

国際会議録
国際会議録
9. TRAPPING OF OXYGEN AT HOMOEPITAXIAL Si/Si INTERFACES GROWTH BY MODULAR BEAM EPITAXY
Hull, R. ; Twigg, M.E. ; Bean, J.C. ; Gibson J.M. ; Joy, D.C.
出版情報: Oxygen, carbon, hydrogen, and nitrogen in crystalline silicon : symposium held December 2-5, 1985, Boston, Massachusetts, U.S.A..  pp.317-322,  1986.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 59
10.

国際会議録
国際会議録
10. IMPROVING THE STRUCTURAL AND ELECTRICAL PROPERTIES OF EPITAXIAL CaF2 ON Si BY RAPID THERMAL ANNEALING
Phillips, J.M. ; Manger, M.L. ; Pfeiffer, L. ; Joy, D.C. ; Smith III, T.P. ; Augustyniak, W.M. ; West, K.W.
出版情報: Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A..  pp.155-162,  1985.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 53
11.

国際会議録
国際会議録
11. * THERMAL STRESS DURING ZONE-MELTING-RECRYSTALLIZATION OF SILICON ON INSULATOR FILMS: THE ORIGIN OF SUBBOUNDARIES AND IN-PLANE ORIENTATION OF SOI
Gibson, J.M. ; Pfeiffer, L.N. ; West, K.W. ; Joy, D.C.
出版情報: Semiconductor-on-insulator and thin film transistor technology : symposium held December 3-6, 1985, Boston, Massachusetts, U.S.A..  pp.289-300,  1985.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 53
12.

国際会議録
国際会議録
12. Laser synthesis of single-wall carbon nanotubes with time-resolved in situ diagnostics (Invited Paper)
Geohegan, D.B. ; Puretzky, A.A. ; Schittenhelm, H. ; Fan, X. ; Britt, P.F. ; Guillorn, M.A. ; Simpson, M.L. ; Merkulov, V.I. ; Austin, D.W. ; Pennycook, S.J. ; Joy, D.C.
出版情報: ALT'01 International Conference on Advanced Laser Technologies, 11-14 September, 2001, Constanta, Romania.  pp.268-277,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4762
13.

国際会議録
国際会議録
13. Future of e-beam metrology: obstacles and opportunities (Keynote Paper)
Joy, D.C.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.1-10,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
14.

国際会議録
国際会議録
14. Low-voltage-point source microscope for interferometry
Frost, B.G. ; Joy, D.C. ; Thesen, A.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.576-583,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
15.

国際会議録
国際会議録
15. Simulation of imaging in projection microscope using multibeam probe
Ko, Y.-U. ; Joy, D.C.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.565-575,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4689
16.

国際会議録
国際会議録
16. Laser synthesis of single-wall carbon nanotubes with time-resolved in-situ diagnostics
Geohegan, D.B. ; Puretzky, A.A. ; Schittenhelm, H. ; Fan, X. ; Britt, P.F. ; Guillorn, M.A. ; Simpson, M.L. ; Merkulov, V.I. ; Austin, D.W. ; Pennycook, S.J. ; Joy, D.C.
出版情報: Nanoscience Using Laser-Solid Interactions.  pp.1-10,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4636
17.

国際会議録
国際会議録
17. Soft electron beam etching for precision TEM sample preparation
Rack, P.D. ; Thesen, A. ; Randolph, S. ; Fowlkes, J.D. ; Joy, D.C.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.943-949,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
18.

国際会議録
国際会議録
18. Low vacuum microscopy for mask metrology
Joy, D.C.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.10-17,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5375
19.

国際会議録
国際会議録
19. Simulation of repairing thin-film phase defect in masks for EUV lithography
Ko, Y.-U. ; Joy, D.C. ; Hector, S.D. ; Lu, B.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.293-302,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038