1.

国際会議録
国際会議録
1. Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.
Jones, R.L. ; Hu, T. ; Lin, E.K. ; Wu, W. ; Casa, D.M. ; Orji, N.G. ; Vorburger, T.V. ; Bolton, P.J. ; Barclay, G.G.
出版情報: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.191-199,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5038
2.

国際会議録
国際会議録
2. Deprotection volume characteristics and line-edge morphology in chemcially amplified resists
Jones, R.L. ; Hu, T. ; Prabhu, V.M. ; Soles, C.L. ; Lin, E.K. ; Wu, W. ; Goldfarb, D.L. ; Angelopoulos, M. ; Trinque, B.C.] ; Willson, C.G.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.1031-1040,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
3.

国際会議録
国際会議録
3. X-ray absorption spectroscopy to probe interfacial issues in photolithography
Lenhart, J.L. ; Fischer, D.A. ; Sambasivan, S. ; Lin, E.K. ; Jones, R.L. ; Soles, C.L. ; Wu, W. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XX.  1  pp.343-356,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
4.

国際会議録
国際会議録
4. Polymer dynamics and diffusive properties in ultrathin photoresist films
Soles, C.L. ; Jones, R.L. ; Lenhart, J.L. ; Prabhu, V.M. ; Wu, W. ; Lin, E.K. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XX.  1  pp.366-375,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
5.

国際会議録
国際会議録
5. Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts
Prabhu, V.M. ; Jones, R.L. ; Lin, E.K. ; Soles, C.L. ; Wu, W. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XX.  1  pp.404-414,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039