1.

国際会議録
国際会議録
1. Measurements of water distribution in thin lithographic films
Vogt, B.D. ; Soles, C.L. ; Prabhu, V.M. ; Jones, R.L. ; Wu, W.-L. ; Lin, E.K. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XXI.  pp.56-62,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5376
2.

国際会議録
国際会議録
2. Chain conformation in ultrathin polymer films
Jones, R.L. ; Soles, C.L. ; Starr, F.W. ; Lin, E.K. ; Lenhart, J.L. ; Wu, W.-L. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.342-350,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
3.

国際会議録
国際会議録
3. Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry
Lin, E.K. ; Soles, C.L. ; Goldfarb, D.L. ; Trinque, B.C. ; Burns, S.D. ; Jones, R.L. ; Lenhart, J.L. ; Angelopoulos, M. ; Willson, C.G. ; Satija, S.K. ; Wu, W.-L.
出版情報: Advances in Resist Technology and Processing XIX.  Part One  pp.313-320,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4690
4.

国際会議録
国際会議録
4. Deprotection volume characteristics and line-edge morphology in chemcially amplified resists
Jones, R.L. ; Hu, T. ; Prabhu, V.M. ; Soles, C.L. ; Lin, E.K. ; Wu, W. ; Goldfarb, D.L. ; Angelopoulos, M. ; Trinque, B.C.] ; Willson, C.G.
出版情報: Advances in Resist Technology and Processing XX.  2  pp.1031-1040,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
5.

国際会議録
国際会議録
5. X-ray absorption spectroscopy to probe interfacial issues in photolithography
Lenhart, J.L. ; Fischer, D.A. ; Sambasivan, S. ; Lin, E.K. ; Jones, R.L. ; Soles, C.L. ; Wu, W. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XX.  1  pp.343-356,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
6.

国際会議録
国際会議録
6. Polymer dynamics and diffusive properties in ultrathin photoresist films
Soles, C.L. ; Jones, R.L. ; Lenhart, J.L. ; Prabhu, V.M. ; Wu, W. ; Lin, E.K. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XX.  1  pp.366-375,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039
7.

国際会議録
国際会議録
7. Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts
Prabhu, V.M. ; Jones, R.L. ; Lin, E.K. ; Soles, C.L. ; Wu, W. ; Goldfarb, D.L. ; Angelopoulos, M.
出版情報: Advances in Resist Technology and Processing XX.  1  pp.404-414,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5039