OPC aware mask and wafer metrology
- 著者名:
Maurer, W. ( KLA-Tencor Corp. (USA) ) Wiaux, V. ( IMEC (Belgium) ) Jonckheere, R.M. Philipsen, V. Hoffmann, T. Verhaegen, S. Ronse, K.G. England, J.G. ( KLA-Tencor Corp. (USA) ) Howard, W.B. - 掲載資料名:
- 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4764
- 発行年:
- 2002
- 開始ページ:
- 175
- 終了ページ:
- 181
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445315 [0819445312]
- 言語:
- 英語
- 請求記号:
- P63600/4764
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
国際会議録
Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |