1.

国際会議録
国際会議録
1. Hardware, materials, and parameters optimization for improvement of immersion overlay
W. Ma ; Y. Hwang ; E. Kang ; S. Park ; J. Kang ; C. Lim ; S. Moon
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
2.

国際会議録
国際会議録
2. Study on the reduction of defects in immersion lithography
K. Ban ; S. Park ; C. Bok ; H. Lim ; J. Heo ; H. Chun ; J. Kang ; S. Moon
出版情報: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6519
3.

国際会議録
国際会議録
3. Alignment system and process optimization for improvement of double patterning overlay
W. Ma ; J. Kang ; C. Lim ; H. Kim ; S. Moon
出版情報: Metrology, inspection, and process control for microlithography XXII.  2  pp.69222T-1-69222T-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6922