1.

国際会議録
国際会議録
1. Enhanced hole shape of flash devices in ArF lithography by eliptical mask bias technique
Y. Jeon ; S. Jun ; J. Kang ; S. Lee ; J. Kim ; K. Kim
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
2.

国際会議録
国際会議録
2. Advanced new OPC method to improve OPC accuracy for sub-90nm technology
J. Choi ; J. Kang ; Y. Shim ; K. Yun ; J. Hong ; Y. Lee ; K. Kim
出版情報: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6520
3.

国際会議録
国際会議録
3. Methodology to set up accurate OPC model using optical CD metrology and atomic force microscopy
Y. Shim ; J. Kang ; S. Lee ; J. Kim ; K. Kim
出版情報: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6518
4.

国際会議録
国際会議録
4. Application of enhanced dynamic fragmentation to minimize false error from post OPC verification
J. Kang ; S. uk Lee ; J. Kim ; K. Kim
出版情報: Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 6521