Ishikawa, K. ; Ogawa, H. ; Inomata, C. ; Fujimura, S. ; Mori, H.
出版情報:
Interface control of electrical, chemical, and mechanical properties : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A.. pp.425-, 1994. Pittsburgh. MRS - Materials Research Society
Ogawa, H. ; Ishikawa, K. ; Aoki, M. ; Fujimura, S. ; Ueno, N. ; Horiike, Y. ; Harada, Y.
出版情報:
The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface. pp.428-437, 1996. Pennington, NJ. Electrochemical Society
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