1.

国際会議録
国際会議録
1. IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS
Teerlinck, I. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Hurd, T.Q. ; Mouche, L. ; Mertens, P.W. ; Meuris, M. ; Heyns, M.M. ; Vanhaeren, D. ; Vandervorst, W.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.284-291,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
2.

国際会議録
国際会議録
2. SURFACE COMPLEXATION OF METALS: A PREDICTIVE MODEL BASED ON METAL COORDINATION CHEMISTRY -
Hurd, T.Q. ; Rotondaro, A.L.P. ; Sees, J. ; Misra, A. ; Appel, C.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.105-112,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
3.

国際会議録
国際会議録
3. METAL INTERACTIONS WITH SILICA (SiO2) SURFACES: ADSORPTION AND ION EXCHANGE
Hurd, T.Q. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Mertens, P.W. ; Hall, L.H. ; Heyns, M.M.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.277-283,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20