1.

国際会議録
国際会議録
1. Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography
Wu,F.F. ; Tang,W. ; Wirpszo,K.W. ; Guo,X. ; Xu,M. ; Semyonov,O. ; Huang,C. ; Klibanov,L. ; Panarella,E.
出版情報: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.740-750,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 3997
2.

国際会議録
国際会議録
2. Vacuum spark point source for x-ray/EUV lithography
Guo,X. ; Xu,M. ; Ye,R. ; Huang,C. ; Wirpszo,K.W. ; Panarella,E.
出版情報: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.491-496,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 4343