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Acid diffusion characteristics of RELACS coating for 193-nm lithography

著者名:
Hong, S. ( Clariant (Japan) K.K. (Japan) )
Nishibe, T. ( Clariant (Japan) K.K. (Japan) )
Okayasu, T. ( Clariant (Japan) K.K. (Japan) )
Takahashi, K. ( Clariant (Japan) K.K. (Japan) )
Takano, Y. ( Clariant (Japan) K.K. (Japan) )
Kang, W. ( Clariant (Japan) K.K. (Japan) )
Tanaka, H. ( Clariant (Japan) K.K. (Japan) )
さらに 2 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
285
終了ページ:
293
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.1
資料種別:
国際会議録

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