1.

国際会議録
国際会議録
1. SURFACE PHOTOVOLTAGE MEASUREMENTS OF CONTAMINATION INTRODUCED BY RESIST ASHING PROCESSES
Hoff, A.M. ; Persson, E.J.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.587-593,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
2.

国際会議録
国際会議録
2. CONTROL OF MANUFACTURING CLEANING OPERATIONS USING SURFACE PHOTOVOLTAGE TECHMQUES
Hoff, A.M. ; Persson, E.J. ; Chacon, J. ; DeSelms, B.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.522-529,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7