1.

国際会議録
国際会議録
1. IMPACT OF THE ELECTROCHEMICAL PROPERTIES OF SILICON WAFER SURFACES ON COPPER OUTPLATING FROM HF SOLUTIONS
Teerlinck, I. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Hurd, T.Q. ; Mouche, L. ; Mertens, P.W. ; Meuris, M. ; Heyns, M.M. ; Vanhaeren, D. ; Vandervorst, W.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.284-291,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
2.

国際会議録
国際会議録
2. METAL INTERACTIONS WITH SILICA (SiO2) SURFACES: ADSORPTION AND ION EXCHANGE
Hurd, T.Q. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Mertens, P.W. ; Hall, L.H. ; Heyns, M.M.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.277-283,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
3.

国際会議録
国際会議録
3. *CLEANING OF METAL CONTAMINATION
Mertens, P.W. ; Hurd, T.Q. ; Graf, D. ; Meuris, M. ; Schmidt, H.F. ; Heyns, M.M.
出版情報: Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III.  pp.241-252,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-9
4.

国際会議録
国際会議録
4. Electrochemical Study of Copper Deposition on Silicon Surfaces in HF Solutions
Teerlinek, I. ; Gomes, W.P. ; Strubbe, K. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Electrochemical processing in ULSI fabrication and semiconductor/metal deposition II : proceedings of the international symposium.  pp.156-159,  1999.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-9
5.

国際会議録
国際会議録
5. EVALUATION OF Si SURFACE CONDITIONS BY THE USE OF A SURFACE PHOTOVOLTAGE TECHNIQUE
Trauwaert, M.-A. ; Kenis, K. ; Caymax, M. ; Mertens, P.W. ; Heyns, M.M. ; Vanhellemont, J. ; Graf, D. ; Wagner, P.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.455-462,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
6.

国際会議録
国際会議録
6. VAPOR PHASE DECOMPOSITION - DROPLET COLLECTION EVALUATION OF A WAFER SURFACE PREPARATION SYSTEM
De Gendt, S. ; Arnauts, S. ; Witters, T. ; Boehme, W. ; Gonchond, J.P. ; Huber, A. ; Lerche, J. ; Loewenstein, L. ; Rink, I. ; Wortelboer, R. ; Mueris, M. ; Heyns, M.M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.593-600,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
7.

国際会議録
国際会議録
7. Advanced Wet Cleaning Technology For Highly Reliable Thin Oxides
Verhaverbeke, S. ; Meuris, M. ; Mertens, P. ; Schmidt, H. ; Heyns, M.M. ; Philipossian, A. ; Graeff, D. ; Dillenbeck, K.
出版情報: Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993.  pp.199-219,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-13
8.

国際会議録
国際会議録
8. GRAZINGEMISSION X-RAY FLUORESCENCE SPECTROMETRY: A NOVEL TOOL FOR SURFACE CONTAMINATION ANALYSIS AND THIN FILM METROLOGY
deBokx, P.K. ; Kidd, S.J. ; Wiener, G. ; Urbach, H.P. ; De Gendt, S. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.1511-1523,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-1(2)
9.

国際会議録
国際会議録
9. Effect of Metal Contamination and Improved Cleaning Strategies
Mertens, P.W. ; Bearda, T. ; Lowewenstein, L.M. ; Martin, A.R. ; Hub, W. ; Kolbesen, B.O. ; Teerlink, I. ; Vos, R. ; Baeyens, M. ; Gendt, S.De ; Kenis, K. ; Heyns, M.M.
出版情報: Proceedings of the Third International Symposium on Defects in Silicon.  pp.401-413,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-1
10.

国際会議録
国際会議録
10. HYDROGEN PASSIVATION OF HF-LAST CLEANED (100) SILICON SURFACES: A MIR-FTIR STUDY
Bender, H. ; Verhaverbeke, S. ; Heyns, M.M.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.186-194,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
11.

国際会議録
国際会議録
11. Capturing and Recovery of Tungsten from the Exhaust Stream of a W-CVD Tool
Van Hoornick, N.B.H. ; Van Hoeymissen, J.A.B. ; Heyns, M.M.
出版情報: Environmental issues in the electronics/semiconductor industries and electrochemical/photochemical methods for pollution abatement.  pp.249-261,  1998.  Pennington, N.J..  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-5
12.

国際会議録
国際会議録
12. APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR
Wolke, K. ; Riedel, T. ; Haug, R. ; De Gendt, S. ; Heyns, M.M. ; Meuris, M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.204-211,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
13.

国際会議録
国際会議録
13. A SEMI-QUANTITATIVE METHOD FOR STUDYING PHOTORESIST STRIPPING
Rotondaro, A.L.P. ; Meuris, M. ; Schmidt, H.F. ; Heyns, M.M. ; Vandervorst, W. ; Claeys, C. ; Hellemans, L. ; Snauvaert, I.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.581-586,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
14.

国際会議録
国際会議録
14. DETERMINATION OF THE H-PASSIVATION BUILD-UP TIME IN DHF-TREATMEN
Meuris, M. ; Izumi, H. ; Kubo, K. ; Ojima, S. ; Ohmi, T. ; Heyns, M.M.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.444-448,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
15.

国際会議録
国際会議録
15. IN SITU AND REAL TIME STUDIES OF WET CHEMICAL SILICON SURFACE CLEANING REACTIONS
Schmidt, H.F. ; Teerlinck, I. ; Storm, W. ; Bender, H. ; Heyns, M.M.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.480-491,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
16.

国際会議録
国際会議録
16. A MECHANISM FOR THE SILICON OXIDE GROWTH BY OZONATED SOLUTIONS
De Smedt, F. ; De Gendt, S. ; Cornelissen, I. ; Heyns, M.M. ; Vinckier, C.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.407-415,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
17.

国際会議録
国際会議録
17. EVALUATION OF OZONATED WATER SPRAY FOR RESIST CLEANING APPLICATIONS
De Gendt, S. ; Lux, M. ; Claes, M. ; Van Hoeymissen, J. ; Conrad, T. ; Worth, W. ; Lagrange, S. ; Bergman, E. ; Jassal, A.S. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.391-398,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
18.

国際会議録
国際会議録
18. EFFICIENCY OF OZONATED DI WATER IN REMOVING ORGANIC CONTAMINATION
Kenens, C. ; De Gendt, S. ; Knotter, D.M. ; Loewenstein, L.M. ; Meuris, M. ; Vandervorst, W. ; Heyns, M.M.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.247-255,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35
19.

国際会議録
国際会議録
19. EFFECTIVE POST-ETCH RESIDUE REMOVAL ON LOW-K FILMS USING SINGLE WAFER PROCESSING
Kesters, E. ; Ghekiere, J. ; Van Doorne, P. ; Vereecke, G. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium.  pp.15-22,  2003.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2003-26
20.

国際会議録
国際会議録
20. The impact of Fe and Cu on the minority carrier lifetime of p and n-type silicon wafers
Simoen, E. ; Heyns, M.M. ; Claeys, C. ; Brown, G.
出版情報: ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands.  pp.54-63,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-30
21.

国際会議録
国際会議録
21. Critical Processes for Ultrathin Gate Oxide Integrity
Depas, M. ; Heyns, M.M. ; Nigam, T. ; Kenis, K. ; Sprey, H. ; Wilhelm, R. ; Crossley, A. ; Sofield, C.J. ; Graef, D.
出版情報: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.352-366,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-1
22.

国際会議録
国際会議録
22. Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon
Elshocht, S.Van ; Caymax, M. ; Gendt, S.De ; Conard, T. ; Petry, J. ; Claes, M. ; Witters, T. ; Zhao, C. ; Brijs, B. ; Richard, O. ; Bender, H. ; Vandervorst, W. ; Carter, R. ; Kluth, J. ; Date, L. ; Pique, D. ; Heyns, M.M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.197-202,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
23.

国際会議録
国際会議録
23. CRITICAL ASPECTS OF WAFER CLEANING AND GATE OXIDE INTEGRITY
Mertens, P.W. ; Meuris, M. ; Schmidt, H.F. ; Verhaverbeke, S. ; Heyns, M.M. ; Carr, P. ; Graeff, D. ; Schnegg, A. ; Kubota, M. ; Dillenbeck, K. ; de Blank, R.
出版情報: Proceedings of the Satellite Symposium to ESSDERC 93 Grenoble/France : crystalline defects and contamination: their impact and control in device manufacturing.  pp.87-102,  1993.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1993-15
24.

国際会議録
国際会議録
24. ALD HfO2 Surface Preparation Study
Delabie, Annelies ; Caymax, M. ; Maes, J.W. ; Bajolet, P. ; Brijs, B. ; Cartier, E. ; Conard, T. ; Gendt, S.De ; Richard, O. ; Vandervorst, W. ; Zhao, C. ; Green, M. ; Tsai, W. ; Heyns, M.M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.179-184,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
25.

国際会議録
国際会議録
25. A NEW CLEANING CONCEPT FOR PARTICLE AND METAL REMOVAL ON Si SURFACES
Meuris, M. ; Verhaverbeke, S. ; Mertens, P.W. ; Schmidt, H.F. ; Rotondaro, A.L.P. ; Heyns, M.M. ; Philipossian, A.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.15-25,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
26.

国際会議録
国際会議録
26. SILICON SURFACE ROUGHENING BY THE DECOMPOSITION OF HYDROGEN PEROXIDE
Mertens, P.W. ; Verhaverbeke, S. ; Heyns, M.M. ; Hellemans, L. ; Snauwaert, J. ; Dillenbeck, K.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.102-110,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
27.

国際会議録
国際会議録
27. THE RELATION BETWEEN SODIUM AND ALUMINUM CONTAMINATION AND DIELECTRIC BREAKDOWN IN MOS STRUCTURES
Verneire, B. ; Rotondaro, A.L.P. ; Mertens, P.W. ; Verhaverbeke, S. ; Heyns, M.M.
出版情報: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.58-64,  1994.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 1994-7
28.

国際会議録
国際会議録
28. COMPARISON OF HC1 GAS-PHASE CLEANING WITH CONVENTIONAL AND DILUTE WET CHEMISTRIES
Elsmore, C. ; Hurd, T.Q. ; Clarke, J. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.142-149,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
29.

国際会議録
国際会議録
29. In-situ and real time characterization of wet chemical silicon surface processes by electrochemical open circuit potential measurements
Schmidt, H.F ; Teerlinck, I. ; Meuris, M. ; Mertens, P.W. ; Heyns, M.M.
出版情報: ALTECH 95 : analytical techniques for semiconductor materials and process characterization II : proceedings of the Satellite Symposium to ESSDERC 95, The Hague, The Netherlands.  pp.316-328,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-30
30.

国際会議録
国際会議録
30. 11 Real-Time Monitoring of Wet Chemical Oxidation and Etching Processes on Semiconductor Surfaces for Process Optimization and Waste Minimization
Okorn-Schmidt, H.F. ; Teerlinck, I. ; Biesemans, S. ; Heyns, M.M.
出版情報: Proceedings of the Symposium on Environmental Aspects of Electrochemical Technology: applications in electronics.  pp.140-158,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-21
31.

国際会議録
国際会議録
31. DEVELOPMENT OF ADVANCED CORROSION FREE ORGANIC STRIPPERS FOR ULSI PROCESSING
Rotondaro, A.L.P. ; Honda, K. ; Maw, T. ; Perry, D. ; Lux, M. ; Heyns, M.M. ; Claeys, C. ; Darakchiev, I.
出版情報: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.537-543,  1995.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 95-20
32.

国際会議録
国際会議録
32. 18 Optimized HF Solutions in ULSI Technology
Teerlinck, I. ; Mertens, P.W. ; Vos, R. ; Meuris, M. ; Heyns, M.M.
出版情報: Proceedings of the Symposium on Environmental Aspects of Electrochemical Technology: applications in electronics.  pp.250-263,  1996.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 96-21