1.

国際会議録
国際会議録
1. VAPOR PHASE DECOMPOSITION - DROPLET COLLECTION EVALUATION OF A WAFER SURFACE PREPARATION SYSTEM
De Gendt, S. ; Arnauts, S. ; Witters, T. ; Boehme, W. ; Gonchond, J.P. ; Huber, A. ; Lerche, J. ; Loewenstein, L. ; Rink, I. ; Wortelboer, R. ; Mueris, M. ; Heyns, M.M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.593-600,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
2.

国際会議録
国際会議録
2. GRAZINGEMISSION X-RAY FLUORESCENCE SPECTROMETRY: A NOVEL TOOL FOR SURFACE CONTAMINATION ANALYSIS AND THIN FILM METROLOGY
deBokx, P.K. ; Kidd, S.J. ; Wiener, G. ; Urbach, H.P. ; De Gendt, S. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology.  pp.1511-1523,  1998.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 98-1(2)
3.

国際会議録
国際会議録
3. APPLICATION OF MOIST OZONE GAS PHASE FOR REMOVAL OF RESIST AND ORGANIC CONTAMINATION IN A NOVEL TANK TYPE PROCESSOR
Wolke, K. ; Riedel, T. ; Haug, R. ; De Gendt, S. ; Heyns, M.M. ; Meuris, M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.204-211,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
4.

国際会議録
国際会議録
4. A MECHANISM FOR THE SILICON OXIDE GROWTH BY OZONATED SOLUTIONS
De Smedt, F. ; De Gendt, S. ; Cornelissen, I. ; Heyns, M.M. ; Vinckier, C.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.407-415,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
5.

国際会議録
国際会議録
5. EVALUATION OF OZONATED WATER SPRAY FOR RESIST CLEANING APPLICATIONS
De Gendt, S. ; Lux, M. ; Claes, M. ; Van Hoeymissen, J. ; Conrad, T. ; Worth, W. ; Lagrange, S. ; Bergman, E. ; Jassal, A.S. ; Mertens, P.W. ; Heyns, M.M.
出版情報: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.391-398,  1999.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 99-36
6.

国際会議録
国際会議録
6. EFFICIENCY OF OZONATED DI WATER IN REMOVING ORGANIC CONTAMINATION
Kenens, C. ; De Gendt, S. ; Knotter, D.M. ; Loewenstein, L.M. ; Meuris, M. ; Vandervorst, W. ; Heyns, M.M.
出版情報: Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.247-255,  1997.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 97-35