1.

国際会議録
国際会議録
1. 16 Properties of HfTaxOy High-K Layers Deposited by ALCVD
Zhao, C. ; Rittersma, Z. M. ; Van Berkum, J. G. M. ; Snijders, J. H. M. ; Hendriks, A. ; Breimer, P. ; Groat, P. ; Maes, J. W. ; Wittesr, H. ; Afanas'ev, V. V. ; Tois, E. ; Tuominen, M. ; Caymax, M. ; De Gendt, S. ; Heyns, M.
出版情報: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.133-140,  2005.  Pennington, NJ.  Electrochemical Society
シリーズ名: Electrochemical Society Proceedings Series
シリーズ巻号: 2005-05
2.

国際会議録
国際会議録
2. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A..  pp.287-292,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 809
3.

国際会議録
国際会議録
3. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
出版情報: Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.145-152,  2003.  Warrendale, PA.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 747
4.

国際会議録
国際会議録
4. Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films
Zhao, C. ; Brijs, B. ; Dortu, F. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Besling, W. ; Maes, J.W.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.243-251,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5133
5.

国際会議録
国際会議録
5. Characterization of Nano-Laminate Structure Using Grazing Incidence XRD and ATR-FTIR
Zhao, C. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Consier, V. ; Maes, J.W. ; Roebben, G. ; Van Der Biest, O.
出版情報: Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah.  pp.252-259,  2003.  Pennington, NJ.  SPIE-The International Society for Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5133
6.

国際会議録
国際会議録
6. The Influence of Defects on Compatibility and Yield of the HfO2-PolySilicon Gate Stack for CMOS Integration
Kaushik, V.S. ; Gendt, S.De ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S.V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.335-342,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
7.

国際会議録
国際会議録
7. Thermal Stability of High-k Layers
Zhao, C. ; Cosnier, V. ; Chen, P.J. ; Richard, O. ; Roebben, G. ; Maes, J. ; Elshocht, S.Van ; Bender, H. ; Young, E. ; Biest, O.Van Der ; Caymax, M. ; Vandervorst, W. ; Gendt, S.De ; Heyns, M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.9-14,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
8.

国際会議録
国際会議録
8. Effect of Al-Content and Post Deposition Annealing on the Electrical Properties of Ultra-Thin HfAlxOy Layers
Carter, R.J. ; Tsai, W. ; Young, E. ; Caymax, M. ; Maes, J.W. ; Chen, P.J. ; Delabie, A. ; Zhao, C. ; Gendt, S.De ; Heyns, M.
出版情報: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.35-40,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 745
9.

国際会議録
国際会議録
9. High-k Materials for Advanced Gate Stack Dielectrics: A Comparison of ALCVD and MOCVD as Deposition Technologies
Caymax, Matty ; Bender, H. ; Brijs, B. ; Conard, T. ; Gendt, S. De ; Delabie, A. ; Heyns, M. ; Onsia, B. ; Ragnarsson, L. ; Richard, O. ; Vandervorst, W. ; Elshocht, S. Van ; Zhao, C. ; Maes, J. W. ; Date, L. ; Pique, D. ; Young, E. ; Tsai, W. ; Shimamoto, Y.
出版情報: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.47-58,  2003.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 765
10.

国際会議録
国際会議録
10. Physical Characterization of HfO2 Deposited on Ge Substrates by MOCVD
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
出版情報: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.163-168,  2004.  Warrendale, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 811