1.

国際会議録
国際会議録
1. Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging
Chiou, T.-B. ; Chen, A. C. ; Hsu, S. D. ; Eurlings, M. ; Hendrickx, E.
出版情報: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.21-31,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5645
2.

国際会議録
国際会議録
2. Experimental verification of a model-based decomposition method for double dipole lithography
Eurlings, M. ; Hsu, S.D. ; Hendrickx, E. ; op 't Root, W. ; Laidig, T.L. ; Chiou, T.-B. ; Chen, A. ; Chen, F. ; Vandenberghe, G. ; Finders, J.
出版情報: Optical Microlithography XVII.  pp.1225-1236,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5377
3.

国際会議録
国際会議録
3. Double dipole lithography for 65-nm node and beyond: a technology readiness review
Hsu, S.D. ; Eurlings, M. ; Hendrickx, E. ; Van Den Broeke, D.J. ; Chiou, T.-B. ; Chen, J.F. ; Laidig, T.L. ; Shi, X. ; Finders, J.
出版情報: Photomask and Next-Generation Lithography Mask Technology XI.  pp.481-498,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
シリーズ名: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号: 5446