Silver Metallization With Reactively Sputtered TiN Diffusion Barrier Films
- 著者名:
Gao, L. Gstottner, J. Emling, R. Linsmeier, Ch. Balden, M. Wiltner, A. Hansch, W. Schmitt-Landsiedel, D. - 掲載資料名:
- Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 812
- 発行年:
- 2004
- 開始ページ:
- 255
- 終了ページ:
- 260
- 総ページ数:
- 6
- 出版情報:
- Warrendale: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997622 [1558997628]
- 言語:
- 英語
- 請求記号:
- M23500/812
- 資料種別:
- 国際会議録
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