1.

国際会議録
国際会議録
1. DOUBLE BEAM PHOTOCONDUCTIVITY MODULATION SYSTEM AND ITS APPLICATION TO THE CHARACTERIZATION OF A PROCESS OF PHOTORESIST REMOVAL
Usami, A. ; Fujiwara, H. ; Nakai, T. ; Matsuki, K. ; Takeuchi, T. ; Wada, T.
出版情報: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.261-268,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 259
2.

国際会議録
国際会議録
2. EVALUATION USING ANONCONTACT LASER BEAM INDUCED CONDUCTIVITY/CURRENT METHOD FOR THE SILICON-ON-INSULATOR MADE BY WAFER BONDING
Usami, A. ; Nakai, T. ; Fujiwara, H. ; Ishigami, S. ; Wada, T. ; Matsuki, K ; Takeuchi, T.
出版情報: Defect engineering in semiconductor growth, processing and device technology : symposium held April 26-May 1, 1992, San Francisco, California, U.S.A..  pp.295-300,  1992.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 262
3.

国際会議録
国際会議録
3. CONTACTLESS MEASUREMENTS OF SLIP LINES INTENTIONALLY INTRODUCED IN Si WAFERS DURING RAPID THERMAL PROCESSING
Usami, A. ; Shiraki, H. ; Fujiwara, H. ; Abe, R. ; Osamura, N. ; Ichimura, M. ; Wada, T.
出版情報: Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.215-222,  1991.  Pittsburgh, Pa..  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 224