Blank Cover Image

The Effect of the Extra Ion on Residual Damage in MeV-Implanted Si

著者名:
Libertino, S.
Benton, J. L.
Coffa, S.
Jacobson, D. C.
Eaglesham, D. J.
Poate, J. M.
Lavalle, M.
Fuochi, P. G.
さらに 3 件
掲載資料名:
Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
469
発行年:
1997
開始ページ:
187
出版情報:
Pittsburg, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993730 [1558993738]
言語:
英語
請求記号:
M23500/469
資料種別:
国際会議録

類似資料:

1 国際会議録 Characterization of Interstitial Defect Clusters in Ion-Implanted Si

Benton, J. L., Libertino, S., Coffa, S., Eaglesham, D. J.

MRS - Materials Research Society
7 国際会議録 Trends in Ion Implantation for Semiconductor and Optical Materials Reserch

Poate M. J., Jacobson C. D., Eaglesham J. D.

Kluwer Academic Publishers
2 国際会議録 Defect Evolution in Ion Implanted Silicon

Benton, J.L., Libertino, S., Eaglesham, D.J., Coffa, S.

Electrochemical Society
8 国際会議録 ERBIUM-DEFECT INTERACTIONS IN SILICA FILMS IMPLANTED WITH MeV Er IONS

Polman, A., Jacobson, D. C., Poate, J. M.

Materials Research Society
3 国際会議録 The Mechanisms of Iron Gettering in Silicon by Boron Ion-Implantation

Benton, J.L., Stolk, P.A., Eaglesham, D.J., Jacobson, D.C., Cheng, J.Y., Poate, J.M., Myers, S.M., Haynes, T.E

Electrochemical Society
9 国際会議録 The Effect of Impurity Content and Ion Mass on the Depth Profiles of Vacancy-Type Defects in MeV-Implanted Si

Libertino, S., Coffa, S., Privitera, V., Priolo, F.

MRS - Materials Research Society
4 国際会議録 Defect Evolution in Ion Implanted Si: From Point to Extended Defects

Libertino, Sebania, Benton, Janet L., Coffa, Salvatore, Eaglesham, Dave J.

MRS - Materials Research Society
10 国際会議録 The Effect of Impurity Content and Ion Mass on the Depth Profiles of Vacancy-Type Defects in MeV-Implanted Si

Libertino, S., Coffa, S., Privitera, V., Priolo, F.

MRS - Materials Research Society
5 国際会議録 MESOTAXY LAYERS OF IrSi3 IN (111)Si FORMED BY MeV ION IMPLANTATION

Short, K. T., White, Alice E., Eaglesham, D. J., Jacobson, D. C., Poate, J. M.

Materials Research Society
11 国際会議録 Impact of Metal Contamination of 7.0 nm Gate Oxides on Various Substrate Materials

Saito, S., Hamada, K., Eaglesham, D. J., Shiramizu, Y., Benton, J. L., Kitajima, H., Jacobson, S. D. C., Poate, J. M.

MRS - Materials Research Society
6 国際会議録 ION IMPLANTED CALIBRATION STANDARDS FOR Si SURFACE CONTAMINATION DETECTION BY TXRF

Jacobson, D. C., Poate, J. M., Higashi, G. S., Boone, T., Eaglesham, D. J., Hockett, Richard

MRS - Materials Research Society
12 国際会議録 Impact of Metal Contamination of 7.0 nm Gate Oxides on Various Substrate Materials

Saito, S., Hamada, K., Eaglesham, D. J., Shiramizu, Y., Benton, J. L., Kitajima, H., Jacobson, S. D. C., Poate, J. M.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12