1.

国際会議録
国際会議録
1. Impact of Metal Contamination of 7.0 nm Gate Oxides on Various Substrate Materials
Saito, S. ; Hamada, K. ; Eaglesham, D. J. ; Shiramizu, Y. ; Benton, J. L. ; Kitajima, H. ; Jacobson, S. D. C. ; Poate, J. M.
出版情報: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.81-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 477
2.

国際会議録
国際会議録
2. Impact of Metal Contamination of 7.0 nm Gate Oxides on Various Substrate Materials
Saito, S. ; Hamada, K. ; Eaglesham, D. J. ; Shiramizu, Y. ; Benton, J. L. ; Kitajima, H. ; Jacobson, S. D. C. ; Poate, J. M.
出版情報: Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A..  pp.141-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 473