1.

国際会議録
国際会議録
1. Improvement in Gate Dielectric Quality of Ultra Thin a: SiN:H MNS Capacitors by Hydrogen Etching of the Substrate
Waghmare, Parag C. ; Patil, Samadhan B. ; Dusane, Rajiv O. ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.171-176,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716
2.

国際会議録
国際会議録
2. Electrically Induced Junction MOSFET For High Performance Sub-50nm CMOS Technology
Dixit, Abhisek ; Dusane, Rajiv O. ; Rao, V. Ramgopal
出版情報: Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A..  pp.305-310,  2002.  Warrendale.  Materials Research Society
シリーズ名: Materials Research Society symposium proceedings
シリーズ巻号: 716