Fabrication of SOI Substrates with Buried Silicide Layers for BiCMOS Applications
- 著者名:
Wiemer, M. Zimmermann, S. Zhao, Q.T. Trui, B. Kaufmann, C. Mantl, S. Dudek, V. Gessner, T. - 掲載資料名:
- Semiconductor wafer bonding : science, technology, and applications : proceedings of the international symposia
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2005-02
- 発行年:
- 2005
- 開始ページ:
- 303
- 終了ページ:
- 310
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774604 [1566774608]
- 言語:
- 英語
- 請求記号:
- E23400/200502
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Fabrication of nanometer Schottky-tunneling MOSFETs by a novel silicide nanopatterning method
SPIE - The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Kluwer Academic Publishers |
Materials Research Society |
Electrochemical Society |
MRS - Materials Research Society |